Pall introduces new flow filter

Published: 2-Feb-2005


Pall Corporation's Microelectronics group has extended its support for the fast-growing display and semiconductor markets with a new PTFE-based filter for high-flow, high-purity, bulk gas delivery systems. The new High-Flow Emflon filters enable users to shrink the footprint of their filter systems, resulting in lower capital and operational costs. Pall designed the High-Flow Emflon filter for use in the newest generations of display and semiconductor manufacturing facilities, which need to filter bulk nitrogen and clean dry air (CDA) at flow rates in excess of 1,700 Nm3/h and 1,000 SCFM. "High-Flow Emflon filter systems allow customers to use smaller filter housings, saving precious fab space. A customer will realise average savings of greater than 20% on system installations and greater than 50% on system maintenance," said Steve Chisolm, president of Pall Microelectronics. Based on Pall's patented Ultipleat technology, the new Emflon filters offer flow rates of up to 6,500 Nm3/h (3,800 SCFM) for a single 1,016mm/(40 inch) cartridge and a removal rating of 0.003 micron. A single 1,016mm High-Flow Emflon filter can replace a typical filter system requiring up to 30 standard 254mm (10 inch) filters. The new filters have begun shipping to several LCD manufacturing plants in Asia.

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