A new addition to the filter family
Extraction Systems has introduced the newest addition to its VaporSorb filter family, the VaporSorb CSP-32, a unique hybrid media chemical air filter that removes the array of molecular contaminants affecting 248nm, 193nm and 157nm lithography environments. The new filter media gives customers a comprehensive, low cost of ownership method of protecting optics and resists in advanced lithography processes. VaporSorb CSP-32 is available for use on systems from all exposure tool manufacturers worldwide. "VaporSorb CSP-32 uses a combination of media to remove contaminants and protect exposure tools now and in the future," said Dave Ruede, filter group manager at Extraction. "We worked with a leading exposure tool manufacturer to test its performance, and we are confident it provides state-of-the-art performance in protecting optics and reticles in current and new exposure environments." As with all of Extraction's filtration products, VS-CSP-32 filters are installed in a serial array for unparalleled protection against unplanned elevated contamination events, such as accidental spills of solvents and developer chemicals. The hybrid filter incorporates Extraction's Interstack Sample Port design to provide advanced warning of filter breakthrough and prevention of inadvertent optical sufaces and resist contamination by spent filters usually a concern with less-advanced parallel flow designs.
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