Real-time monitoring

Published: 22-Jul-2004


Particle Measuring Systems has launched its AiM-200 real-time molecular contamination monitor. The AiM-200 monitors contamination on critical surfaces such as optics or wafers, where haze formation problems are caused by organic condensables in purge gases or in the ambient environment. Users can quantify in real-time the effect of trace acidic vapours that degrade exposed metal line structures and coated metallic surfaces. Chemical filter performance is easily tracked by monitoring for post-filter breakthrough of VOCs or acids. The AiM-200 can be run with two sensors to allow two independent locations to be monitored simultaneously, has active temperature control to maintain a consistent operating environment, stores up to 50,000 samples, and operates with sample intervals as low as 10 seconds. Increased sensitivity allows for detection of mass depositions of 0.003ng/cm2/Hz. Data can be downloaded to Excel via Ethernet or RS232 communications, or collected in real-time using Facility Net Software. Tel: +1 303 546 7336 nakindele@pmeasuring.com

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