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Hi Tech Manufacturing

Meeting the needs of EUV lithography

The requirements to reduce airborne molecular contamination (AMC) in semiconductor manufacturing cleanrooms are becoming more stringent as the industry prepares to migrate to extreme ultraviolet (EUV) lithography. The Tiger-i platform of analysers from Tiger Optics eliminate the concerns arising from other analytical techniques. By utilising Tiger’s patented CW-CRDS technique, the instruments provide calibration-free, real-time analysis without the concerns of a radioactive source
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